The INGENIA system also allows users to leverage the new S3p™ – Scalable Pulsed Power Plasma – technology, the Oerlikon Balzers HIPIMS solution. This refinement supports the unrestricted, cost-effective deployment of HIPIMS technology in production as well as research and development – a quantum leap in the domain of coatings. S3p™ combines the advantages of arc and sputtering technologies: high ionisation with virtually no droplets. The result: extremely smooth and dense coatings for a wide variety of applications.
S3p™ makes individually scalable Power densities possible which in turn opens unprecedented dimensions in terms of ionisation. Thus, S3p™ offers previously unavailable options for the optimisation of coating structures and properties, allowing the use of a wide range of coating materials with an impressively homogeneous coating thickness distribution.
The unlimited scalability of pulse parameters – from DC-like sputtering with unlimited pulse length to extreme power densities opens entirely new horizons: The degree of ionisation can be adjusted individually, from low to very high levels. That allows countless variations in coating structure.